TY - GEN
AU - U. Ehrke, A. Sears, L. Alff, D. Reisinger
T1 - High resolution depth profiling of thin STO in high-k oxide material
CY - 
PY - 2004
PB - 
T3 - Applied Surface Science
VL - 231
UR - http://dx.doi.org/10.1016/j.apsusc.2004.03.120
SN - 0169-4332